Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

From: Critical Reviews in Solid State and Materials Sciences | Date: July 1, 2006| Author: Randolph, S J; Fowlkes, J D; Rack, P D | Copyright information

Focused electron-beam-induced (FEB-induced) deposition and etching are versatile, direct-write nanofabrication schemes that allow for selective deposition or removal of a variety of materials. Fundamentally, these processes are governed by an electron-induced reaction with a precursor vapor, which may either result in decomposition to a solid deposit or formation of a volatile etch by-product. The ability to induce such localized reactions by placement of a nanometer-sized focused electron pr...

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