Pulsed plasma deposition creates new era for PVD. (plasma vapor deposition)(Thin-Film Technology)

From: R & D | Date: December 1, 1996| Author: Goedicke, K.; Kirchoff, V.; Schiller, N.; Schiller, S. | Copyright information

Pulsed plasma deposition processes eliminate the weakness of the current industrial DC and radio frequency plasma deposition processes. Magnetron sputtering deficiencies are easily overcome by using the pulsed techniques in the 10-kHz to 100-kHz range.

Pulsing a plasma source can eliminate all the deficiencies of current plasma-deposition techniques, even though no one understands why.

Until the mid-1970s, sputtering techniques played a minor role compared to evaporation p...

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