Advances in sputter coating: rotatable sputter targets and advanced rotatable magnetrons will further transform the coating marketplace through increased material efficiency and cost reductions.

From: Advanced Materials & Processes | Date: March 1, 2006| Author: | Copyright information

Magnetron sputtering is a vacuum coating process for depositing thin films on glass. Since their invention in the late 1960s, sputtering electrodes have undergone a developmental revolution. The most significant technological advances are rotating cylindrical magnetrons (Fig. 1) and advanced rotating cylindrical sputter targets (Fig. 2). These two parallel developments have enabled manufacturers to boost coating throughput and reduce cost, while maintaining layer quality and thickness consistency.

[FIGURE 1 OMITTED]

This article shows that rotatable magnetron sputtering ...

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